MANN VLSI RESEARCH

Layout / Verification

Final layout of the design is carried out with Tanner's L-Edit. This tool supports the technologies available through multi-project vendors (described under Prototyping). Years of layout experience and many pre-existing cells guarantee quick conversion of proven designs into working mask sets for subsequent fabrication. Digital designs are placed and routed within L-Edit using standard cell libraries which can be custom tailored using Mentor Graphic's XlibCreator. A complete LVS (layout verses schematic) and design rule check (DRC) capability ensures that the final layout is exactly the same as the schematic designs.

Key Benefits
       4Capable of Supporting Most Existing Fabrication
           Processes
       4Working First Run Silicon Typical
       4Standard Mask Formats (CIF & GDS)

Other Services
4Algorithm / Architecture Development
4Circuit Design / Simulation
4IC Prototyping

Last modified: January 13, 2004